When the requirement for surface cleanliness no longer stops at the “clean” level but reaches the “micro” and “absolutely safe” level, Rama R3F was born as an answer. This is the smart ultrasonic cleaning tank line, the most advanced generation of Rama, specially designed for applications requiring the highest level of control and precision.
At the heart of the Rama R3F is a groundbreaking 3-frequency ultrasonic system of 40kHz, 80kHz and 120kHz , allowing users to fine-tune the cleaning process to an unprecedented level.

3 Frequency Customization
Each frequency on the Rama R3F represents a different level of cleaning, allowing users to approach every material and stain scientifically and effectively.
1. 40kHz Frequency – Powerful, Comprehensive Cleaning Platform
- Mechanism: This is the “gold standard” frequency in the industry, creating cavitation bubbles with balanced energy, strong enough to effectively remove common contaminants.
- Application: Ideal for handling common stains such as grease, industrial dirt, metal shavings on mechanical parts, tools, etc. This is a basic and effective cleaning step for most not-so-sensitive applications.
2. 80kHz frequency – Cleans sensitive parts and surfaces
- Mechanism: Higher frequencies create smaller and denser bubbles. Their impact force is gentler but they are able to penetrate deeper into complex structures.
- Application: Perfect for cleaning objects with many grooves, blind holes, or vulnerable surfaces. Often used for complex electronic circuit boards, medical instruments with many details, precision mechanical parts.
3. 120kHz frequency – Micro-cleaning level, absolutely safe
- Mechanism: At this extremely high frequency, the bubbles generated are microscopic in size, creating an extremely gentle cavitation effect, almost like a micro-flow acting on the surface.
- Application: This is a dedicated frequency for the most delicate and expensive materials and products, where surface preservation is a top priority.
- Clean optical lenses, prisms, camera sensors.
- Cleaning semiconductor wafers and microelectronic components.
- Cleaning of high-end watch parts, aerospace parts.
- Cleaning of ultra-sensitive laboratory instruments.
Diverse capacity, expanding application capabilities

The Rama R3F series offers a wide capacity range from 4.5L to 30L, ensuring 3-frequency cleaning technology can handle any size job.
- Small capacity (4.5L – 6.5L): Ideal for laboratories, clinics, or small repair shops. Suitable for cleaning electronic components, medical and dental instruments, and precision parts.
- Medium Capacity (10L – 15L): For medium-sized mechanical workshops or production lines. This size is effective for handling machine parts, small molds, or cleaning multiple tool sets at the same time.
- Large capacity (22L – 30L): Aimed at industrial environments, allowing for high-capacity batch cleaning, suitable for large component baskets or bulky machine parts.
OUTSTANDING ADVANTAGES OF RAMA RT
| Comparison content | Rama RT | Other lines on the market | Source | USP/Notes |
| Probe | High performance, even wave transmission | Standard probe | Rama RT Catalogue | Even cleaning, energy saving |
| Noise-canceling design | Soundproofing materials, seamless joints | Regular stainless steel shell, welds easily vibrate and make noise | ![]() |
Smooth operation, high durability |
| Bottom of the tank | Multi-layer composite, 1 mm thick | Old stainless steel tank 0.8 mm | ![]() |
Durable, corrosion resistant, vibration damping |
| Degas feature | Fast de-bubble removal | Only available in high-end lines | Rama Catalogue | Increased cleaning efficiency |
| Sweep feature | Frequency scanning, even energy distribution | Only available in high-end lines | Rama Catalogue | Clean evenly, no dead spots |
| Pulse feature | Strong ultrasonic pulse, breaks down stubborn stains | Only available in high-end lines | Rama Catalogue | Outstanding efficiency |

Specifications
| MODEL | CAPACITY | PROBE | POWER | FREQUENCY | TIMER | POWER | Sink Design | EXTERNAL KT | DRAINAGE |
| L | Female | W | KHZ | S | W | (LⅹwⅹH)mm | (LⅹwⅹH)mm | ||
| R3F-4.5L(150W) | 4.5L | 3 | 150 | 40/80/120 | 1-9999s | 450 | 300*150*100 | 325*175*255 | HAVE |
| R3F-4.5L(200W) | 4.5L | 4 | 200 | 40/80/120 | 1-9999s | 450 | 300*150*100 | 325*175*255 | HAVE |
| R3F-6.5L(150W) | 6.5L | 3 | 150 | 40/80/120 | 1-9999s | 450 | 300*150*150 | 325*175*305 | HAVE |
| R3F-6.5L(200W) | 6.5L | 4 | 200 | 40/80/120 | 1-9999s | 450 | 300*150*150 | 325*175*305 | HAVE |
| R3F-10L (200W) | 10L | 4 | 200 | 40/80/120 | 1-9999s | 600 | 300*240*150 | 325*265*300 | HAVE |
| R3F-10L (400W) | 10L | 8 | 400 | 40/80/120 | 1-9999s | 600 | 300*240*150 | 325*265*300 | HAVE |
| R3F-14L (200W) | 14L | 4 | 200 | 40/80/120 | 1-9999s | 600 | 300*240*200 | 325*265*380 | HAVE |
| R3F-14L (400W) | 14L | 8 | 400 | 40/80/120 | 1-9999s | 600 | 300*240*200 | 325*265*380 | HAVE |
| R3F-15L (300W) | 15L | 6 | 300 | 40/80/120 | 1-9999s | 1000 | 330*300*150 | 355*325*330 | HAVE |
| R3F-15L (500W) | 15L | 10 | 500 | 40/80/120 | 1-9999s | 1000 | 330*300*150 | 355*325*330 | HAVE |
| R3F-19L (300W) | 19L | 6 | 300 | 40/80/120 | 1-9999s | 1000 | 330*300*200 | 355*325*380 | HAVE |
| R3F-19L (500W) | 19L | 10 | 500 | 40/80/120 | 1-9999s | 1000 | 330*300*200 | 355*325*380 | HAVE |
| R3F-22L (500W) | 22L | 10 | 500 | 40/80/120 | 1-9999s | 1000 | 500*300*150 | 530*330*335 | HAVE |
| R3F-22L (800W) | 22L | 16 | 800 | 40/80/120 | 1-9999s | 1000 | 500*300*150 | 530*330*335 | HAVE |
| R3F-30L | 30L | 10 | 800 | 40/80/120 | 1-9999s | 1000 | 500*300*200 | 530*330*385 | HAVE |
Specialized application of 3 Frequency Ultrasonic Cleaning Tank Rama R3F
The Rama R3F ultrasonic cleaner is no ordinary cleaning device. With the ability to operate at three frequencies of 40kHz, 80kHz, and 120kHz , it is designed as a precision instrument, aimed at industries and research fields with the most stringent requirements for surface cleanliness.
Here are some real-world applications where Rama R3F comes into its own:

1. Semiconductors & Electronics
- Challenge: Need to remove sub-micron particles, photoresist residue, and flux from silicon wafers, high-density printed circuit boards (PCBs), and microelectronic components without causing any physical damage to the surface or delicate interconnects.
- R3F Solution:
- 80kHz Frequency: Used for effective cleaning of circuit boards after soldering, removing solder flux from high density areas and under BGA chips.
- 120kHz Frequency: The ultimate choice for final cleaning of semiconductor wafers and ultra-sensitive components. This extremely gentle ultrasonic wave removes microscopic contaminants without causing pitting or disrupting nanostructures.
2. Medical, dental & precision instruments
- Challenge: Surgical instruments, endoscopes, medical implants, and dental instruments require absolute cleanliness, not only physically but also biologically. Threaded, porous, or complex surfaces are the most likely places for bacteria and dirt to accumulate.
- R3F Solution:
- 40kHz Frequency: Used for the initial stage to remove coarse organic contaminants such as dried blood, tissue, or dental cement on stainless steel instruments.
- 80kHz Frequency: Cleans deep into joints, screw threads and narrow channels of endoscopes, ensuring no residue remains.
- 120kHz frequency: Ideal for cleaning delicate implants (titanium implants, dental implants) and microsurgical instruments, ensuring completely clean and biocompatible surfaces before final sterilization.
3. Optical industry and high-end manufacturing
- Challenge: The surfaces of camera lenses, prisms, sensors, and high-end watch components are extremely sensitive. Fingerprints, grease, dust, and polishing compounds must be completely removed without scratching the surface or damaging the anti-reflection coatings.
- R3F Solution:
- 80kHz Frequency: Gently removes fingerprints and light dirt from optical glass surfaces and finely machined metal parts.
- 120kHz frequency: The only choice for the final cleaning stage, ensuring perfect lens clarity, leaving no streaks or residues, absolutely preserving delicate coatings.
4. Laboratory and research & development (R&D)
- Challenge: In scientific research, glassware (pipettes, test tubes) and analytical instrument components need to be clean at the molecular level to ensure that experimental results are not skewed by cross-contamination.
- R3F Solution:
- Multi-stage cycle: An automated process can be programmed, starting with 40kHz to wash out common contaminants, then transitioning through 80kHz and 120kHz to achieve analytical grade cleanliness, ready for the most sensitive experiments.
The application of Rama R3F is not limited to “cleaning”, but to “surface treatment and finishing”. It is an indispensable tool for any production or research process where even a small dust particle can cause major errors.

















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